• Full spectral range calibration over 400nm -1100 nm
• ?/100 rms absolute accuracy over 600? dynamic range
• patented measurement of phase and intensity, simultaneously and independently
• patented microlens array technology manufactured in-house
• 20 Hz, full resolution

• 10 nm rms accuracy over the full visible spectrum (monochromatic or polychromatic)
• optimized for large wavelength range (400-700 nm)
• patented measurement of phase and intensity, simultaneously and independently
• patented microlens array technology manufactured in-house
• frame rate of 100 Hz, full-resolution

• ?/100 rms absolute accuracy over 400? dynamic rang
• patented measurement of phase and intensity, simultaneously and independently
• patented microlens array technology manufactured in-house
• frame rate of 100 Hz for high-resolution or 150 Hz for high-speed acquisition

• 1500 – 1600 nm wavelength range with high precision
• Optimizing fiber coupling and, more generally, for aligning and characterize optical systems in the NIR
• Simultaneous and independent measurement of both phase & intensity
• True absolute measurement
• Unbeatable accuracy and dynamic rang

• high-resolution – 1,280 independent measurement points
• Aperture dimension of 4.9 x 6.1 mm²
• Simultaneous and independent measurement of both phase & intensity
• True absolute measurement
• Unbeatable accuracy and dynamic range

– HASO4 VIS

– WaveView software

– MTF software

– PSF software;

This sensor can be used in schools or universities for educational purpose

• ?/100 absolute accuracy over 400? dynamic range
• Patented measurement of phase and intensity, simultaneously and independently
• Patented microlens array technology manufactured in-house
• Frame rate of 100 Hz for high-resolution or 150 Hz for high-speed acquisition

• Working wavelength range between 400 and 1100 nm
• Highest speed at 905 Hz
• Highest relative accuracy of ?/150 rms
• True absolute measurement with ?/100 rms
• Simultaneous and independent measurement of both phase & intensity
• Unbeatable accuracy and dynamic range

• Working wavelength range between 4 and 40 nm
• Highest-resolution – 5184 independent measurement points
• Large aperture dimension of 13 x 13 mm²
• Ultra short wavelength beam characterization, adjustment and alignment
• EUV lithography
• Synchrotron and X-FEL beam alignment and characterization

• Perfectly adapted to a beam diameter from 20mm to 500mm
• Optimized design for your laser beam
• Dielectric, metallic, or hybrid coating available
• Replaceable reflective surface and actuator’s motors
• Excellent optical quality with active flat better than 10 nm RMS and minimal print through effect
• Large correction capability

• ±50 µm stroke (tilt p/v)
• 15mm pupil with 52 actuators
• Exceptional surface quality (10 nm rms active flat)
• Excellent stability over time (>10 nm rms / hour / °C)
• Virtually no hysteresis (<2%) • near perfect linearity (>95%)

Surface quality :10 nm rms active flat in closed loop

High dynamic motion : Settling time as low as 0.7 ms within +/-5%.

Excellent linearity and low hysteresis : 
Non linearity error < 3% Hysteresis error < 1 % Coating : protected silver Typical bandwidth > 400 Hz

For Single Molecule Microscopy

For Spinning Disk Microscopy

X-Ray Mirror Characterization

• Correct aberrations and restore diffraction limited PSF
• Aberration-free technique delivers the best 2D and 3D localization precision on the market
• Double the amount of detected photons and improve localization precision
• Easy implementation on any inverted frame microscope
• Possibility to perform single molecule imaging deep in water-based samples (exceeding 50µm)
• Very high optical transmission (up to 95%) in the whole visible wavelength range (400-700nm)

• Plug & Play design for easy implementation
• Increase the intensity of the image more than two times at depths exceeding 20µm
• Reduce the fluorescence excitation power

Meter-scale X-ray mirrors will be characterized with a slope error accuracy better than 50nrad rms.